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The main performance requirements of target |
| AUTHOR : Date : 9/2/2014 7:10:45 PM |
The main performance requirements of target Purity Purity is the main performance indicator targets, because the purity of target significantly affect the properties of the film. However, in practice, the purity of the target are not the same. For example, with the rapid development of microelectronics industry, wafer sizes from 6 ", 8" development to the 12 ", and reduced wiring width of the 0.5um to 0.25um, 0.18um or 0.13um, before the purity of 99.995% of the target meet 0.35umIC technical requirements, and preparation of 0.18um lines on the target purity is 99.999% or 99.9999% requirement. Impurities Target of solid impurities and porosity in the oxygen and water vapor is the main source of the films. Targets for different uses for different impurity content requirements are also different. For example, the semiconductor industry with the aluminum and aluminum alloy target, the alkali metal content and the content of radioactive elements have special requirements. Density In order to reduce the porosity of solid targets to improve the performance of thin film sputtering, usually require a high density target. Not only affect the density of target sputtering rate, also affect the electrical and optical properties of thin films. Target the higher the density, the better the performance of films. In addition, the increased density and intensity of target to target sputtering process to better withstand the thermal stress. Target density is one of the key performance indicators. For the same target, the target of the sputtering fine grain grain coarsening rate than the target of the sputtering rate of speed; the difference between the smaller grain size (distribution) of the target sputtering deposition of thin films of more uniform thickness distribution . |
